Takehiro Kusumoto
12Patents
4h-index
21Co-inventors
56Inventor score
Filing activity: Jan 11, 1988 → Sep 17, 2003
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5585218A | Photoresist composition containing alkyletherified polyvinylphenol | Emerging Cross-Sectional Technologies | 22 | Expired |
| US5304456A | Negative photoresist composition | Emerging Cross-Sectional Technologies | 15 | Expired |
| US5397679A | Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same | Emerging Cross-Sectional Technologies | 7 | Expired |
| US6329119A | Negative type resist composition | Emerging Cross-Sectional Technologies | 6 | Expired |
| US5846688A | Photoresist composition | Emerging Cross-Sectional Technologies | 4 | Expired |
| US5077264A | Cyan dye-donor element used in thermal transfer and thermal transfer sheet using it | Emerging Cross-Sectional Technologies | 4 | Expired |
| US5420331A | Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same | Emerging Cross-Sectional Technologies | 4 | Expired |
| US5395727A | Positive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenol | Physics | 3 | Expired |
| US4977261A | Anthraquinone compound | Chemistry; Metallurgy | 3 | Expired |
| US6156476A | Positive photoresist composition | Emerging Cross-Sectional Technologies | 2 | Expired |
| US5800966A | Positive photoresist composition | Physics | 1 | Expired |
| USRE40964E1 | Negative type resist composition | General | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.