Image reversal negative working photoresist containing O-quinone diazide and cross-linking compound
US5399456A · kind A · utility
10Cited by
33References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 19, 1992 |
| Grant date | Mar 21, 1995 |
| Priority date | — |
| Expiry date | Nov 19, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/168
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for converting a normally positive working photosensitive composition to a negative working composition. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.