Method of manufacturing microelectronic devices having multifunctional photolithographic layers
US5401613A · kind A · utility
22Cited by
2References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 12, 1992 |
| Grant date | Mar 28, 1995 |
| Priority date | — |
| Expiry date | Feb 12, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photolithographic composition having improved processability and which eliminates the need for interlayering multiple special purpose coatings in the production of microelectronic devices is surprisingly made possible by selective dissolution of a polymer and an effective light attenuating material in critical solvents. The polymers which are used in the present invention include homopolymers and copolymers of poly(vinylpyridine).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.