Alignment system for a Half-Field Dyson projection system
US5402205A · kind A · utility
10Cited by
14References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 21, 1992 |
| Grant date | Mar 28, 1995 |
| Priority date | — |
| Expiry date | Dec 21, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An alignment system for a unit magnification system (such as a Half-Field Dyson system) for use in microlithography is provided. The alignment system provides for aligning a pattern on a reticle with a complementary pattern on a wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.