Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same
US5420331A · kind A · utility
4Cited by
1References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 5, 1994 |
| Grant date | May 30, 1995 |
| Priority date | — |
| Expiry date | Apr 5, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/122
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
This invention provides a process for producing a cyclic carbonate compound represented by the following formula (5): ##STR1## or the like which is useful as a dissolution inhibitor for use in a chemically amplified positive photoresist, as well as a positive photoresist composition comprising said cyclic carbonate compound, an alkali-soluble resin and a photo-induced acid precursor. This composition gives a positive photoresist excellent in performances such as resolution, profile, sensitivity, etc.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.