Patent · US Expired

Method and apparatus for inverting samples in a process

US5421889A · kind A · utility

38Cited by
13References
24Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 29, 1993
Grant dateJun 6, 1995
Priority date
Expiry dateJun 29, 2013

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S414/141
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The invention provides apparatus and methods for improving systems which expose samples to reactive plasmas, and more particularly for inverting the sample within these systems. The systems are of the type which have one or more process chambers, at least one intermediate chamber, and a robot transport mechanism to transport the sample between the several chambers. The invention includes flipping and gripping assemblies which mount within the intermediate chamber. These assemblies grasp and remove the sample as transported by the robot mechanism, and invert the sample within the intermediate chamber. The inverted sample is re-positioned at the robot mechanism so that the sample can be transported to one or more process chambers for deposition in a "face down" orientation, which reduces contamination.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.