Patent · US Expired

Arrangement for coating substrates

US5423971A · kind A · utility

19Cited by

17References

12Claims

0Family size

Assignee

Leybold GmBH · DE

Inventors

Manfred Arnold · Meckenbeuren, DE
Guido Blang · Nauheim, DE
Rainer Gegenwart · Rödermark, DE
Klaus Michael · Gelnhausen, DE
Michael Scherer · Crimmitschau, DE
Jochen Ritter · Laubach, DE
Oliver Burkhardt · Hanau, DE

Key dates

Filing date	Jan 10, 1994
Grant date	Jun 13, 1995
Priority date	—
Expiry date	Jan 10, 2014

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/32706
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The invention relates to an electrode configuration for a device for generating a plasma. RF is coupled contactlessly via a capacitive coupling electrode disposed at the dark space distance into a carrier backside of a coating installation. Dark space shields on the coating side define the plasma zone and prevent the formation of parasitic plasmas. HF substrate bias voltage on the moving substrate carrier is achieved with a defined plasma zone and the development of parasitic plasmas is avoided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.