Method for removing particulate contaminants by magnetic field spiking
US5427621A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 29, 1993 |
| Grant date | Jun 27, 1995 |
| Priority date | — |
| Expiry date | Oct 29, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/022
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A novel and improved method of in-situ cleaning unwanted films and particles of a material from a surface situated inside a vacuum chamber by equipping such chamber with a means of generating a magnetic field having a magnetic flux density of at least 25 gauss, flowing at least one gas into the chamber and igniting a plasma and thus producing plasma ions of at least one gas, switching on the magnetic field generating means to a magnetic flux density of no less than 25 gauss and, reducing the magnetic field by a flux density of at least 10 gauss such that the unwanted films and particles of the material are dislodged from the surface by the sudden change in the magnetic flux density at the magnetic field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.