Wafer drying apparatus and fire-extinguishing method therefor
US5431179A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Feb 16, 1994 |
| Grant date | Jul 11, 1995 |
| Priority date | — |
| Expiry date | Feb 16, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S203/07
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A wafer drying apparatus incorporated in a semiconductor wafer cleaning system includes a bath for storing IPA. A heater for generating an IPA vapor is arranged on the bath. The bath is surrounded by a housing. The housing has opening portions at three positions. The opening portions are opened/closed by shutters. A sensor for detecting a fire and a nozzle for discharging CO.sub.2 gas into the bath are arranged around the bath. A plurality of wafers are held by a chuck of a convey robot and are conveyed from the outside of the housing into the housing via the opening portions. When a fire is detected by the sensor, the chuck immediately retreats from the housing, and the shutters are closed. Signals for closing the shutters are transmitted to shutter drive sources again 10 seconds after the fire is detected, and discharging of CO.sub.2 gas is started 20 seconds after the fire is detected.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.