Resist processing method
US5442416A · kind A · utility
90Cited by
11References
66Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jul 7, 1994 |
| Grant date | Aug 15, 1995 |
| Priority date | — |
| Expiry date | Jul 7, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/136
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist process system of the present invention includes at least two robots for conveying a wafer, a passage through which the robots can move, plural process units arranged along the passage, and a waiting unit for temporarily holding the wafer which is to be processed. The waiting unit is arranged beside the passage and between the process units and it includes plural compartments partitioned in it.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.