Apparatus and method for drying substrates
US5443540A · kind A · utility
Assignees
Inventor
Key dates
| Filing date | Dec 22, 1993 |
| Grant date | Aug 22, 1995 |
| Priority date | — |
| Expiry date | Dec 22, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67034
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for drying substrates such as wafers while contacting IPA vapor with them to remove that solution, which adheres to them when they are washed, includes a vessel in which IPA is stored, a unit for supplying the IPA into the vessel, a unit for draining the IPA from the vessel, heater block arranged contactable with the underside of the vessel to heat the IPA in the vessel by heat conduction, a boat elevator for positioning the substrates in a steam existing space in which steam generated from the heated process solution and a water cooling system arranged in the vessel to exchanged heat between the IPA and cooling water so as to cool the IPA, which is to be drained from the vessel, by the cooling water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.