Susceptor for vapor deposition
US5456757A · kind A · utility
356Cited by
2References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 29, 1993 |
| Grant date | Oct 10, 1995 |
| Priority date | — |
| Expiry date | Oct 29, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4581
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A novel susceptor used in a chemical vapor deposition device that is made of a ceramic material, specifically, an aluminum nitride material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.