Michio Aruga
15Patents
12h-index
23Co-inventors
78Inventor score
Filing activity: May 18, 1993 → Jul 22, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6660662B2 | Method of reducing plasma charge damage for plasma processes | Chemistry; Metallurgy | 456 | Expired |
| US7036453B2 | Apparatus for reducing plasma charge damage for plasma processes | Chemistry; Metallurgy | 449 | Expired |
| US5456757A | Susceptor for vapor deposition | Chemistry; Metallurgy | 356 | Expired |
| US5688331A | Resistance heated stem mounted aluminum susceptor assembly | Chemistry; Metallurgy | 317 | Expired |
| US5500249A | Uniform tungsten silicide films produced by chemical vapor deposition | Emerging Cross-Sectional Technologies | 252 | Expired |
| US5643633A | Uniform tungsten silicide films produced by chemical vapor depostiton | Emerging Cross-Sectional Technologies | 46 | Expired |
| US5877086A | Metal planarization using a CVD wetting film | Electricity | 34 | Expired |
| US5482749A | Pretreatment process for treating aluminum-bearing surfaces of deposition chamber prior to deposition of tungsten silicide coating on substrate therein | Chemistry; Metallurgy | 20 | Expired |
| US5558910A | Uniform tungsten silicide films produced by chemical vapor deposition | Emerging Cross-Sectional Technologies | 18 | Expired |
| US5510297A | Process for uniform deposition of tungsten silicide on semiconductor wafers by treatment of susceptor having aluminum nitride surface thereon with tungsten silicide after cleaning of susceptor | Emerging Cross-Sectional Technologies | 16 | Expired |
| US6090706A | Preconditioning process for treating deposition chamber prior to deposition of tungsten silicide coating on active substrates therein | Emerging Cross-Sectional Technologies | 13 | Expired |
| US5997950A | Substrate having uniform tungsten silicide film and method of manufacture | Chemistry; Metallurgy | 13 | Expired |
| US5779848A | Corrosion-resistant aluminum nitride coating for a semiconductor chamber window | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6632726B2 | Film formation method and film formation apparatus | Electricity | 2 | Expired |
| US11687439B2 | Automatic window generation for process trace | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.