Cantilever for atomic force microscope and method of manufacturing the cantilever
US5469733A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 9, 1994 |
| Grant date | Nov 28, 1995 |
| Priority date | — |
| Expiry date | Feb 9, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/879
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A cantilever for an atomic force microscope includes a probe and a cantilever body supporting the probe, the probe deflecting in response to an atomic force between said probe and a sample, at least the surface of the probe including one of a resist film and a sputtered film. One method of manufacturing the cantilever includes selectively etching the surface of a silicon substrate to form an etch pit, forming a resist film in at least the etch pit, forming a nitride film on the resist film, forming a glass base plate on the nitride film in a predetermined area not including the etch pit, and removing the silicon substrate. An atomic force microscope is also provided in which the cantilever is used to measure an atomic force between a sample and the probe having a desired film on a surface. A sample surface evaluating method is further provided by which the adhesion between the desired film or substance and the sample surface can be evaluated quantitatively from the measured atomic force without damaging the sample surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.