Uniform and repeatable plasma processing
US5474648A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 29, 1994 |
| Grant date | Dec 12, 1995 |
| Priority date | — |
| Expiry date | Jul 29, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/334
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Dynamic control and delivery of radio frequency power in plasma process systems is utilized to enhance the repeatability and uniformity of the process plasma. Power, voltage, current, phase, impedance, harmonic content and direct current bias of the radio frequency energy being delivered to the plasma chamber may be monitored at the plasma chamber and used to control or characterize the plasma load. Dynamic pro-active control of the characteristics of the radio frequency power to the plasma chamber electrode during the formation of the plasma enhances the uniformity of the plasma for more exact and controllable processing of the work pieces.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.