Surface analysis method and apparatus for carrying out the same
US5481109A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 11, 1994 |
| Grant date | Jan 2, 1996 |
| Priority date | — |
| Expiry date | Apr 11, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/24415
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A surface analysis method and an apparatus for carrying out the samein which the method involves the detection of fluorescence X-rays emitted from the surface of a sample in response to a finely focused electron beam irradiated thereto, whereby residues on the sample surface are analyzed qualitatively and quantitatively. An electron beam (1) is irradiated through a hole (9) at the center of an X-ray detector (8) into a fine hole (h) on the surface of a sample (2). In response, fluorescence X-rays are emitted from inside the fine hole (h) and are detected by an annular X-ray detector (8) having an energy analysis function near the axis of the electron beam (1) (preferably within 20 degrees with respect to the center axis of the electron beam). This arrangement allows the fluorescence X-rays from the fine hole (h) to reach the X-ray detector (8) without being absorbed by the substance of the material. That in turn ensures qualitative and quantitative analysis of high accuracy about residues in fine holes of large aspect ratios. Since the method is of non-destructive nature, the analyzed sample may be placed unscathed back into the fabrication process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.