Cleaning apparatus
US5482068A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Aug 18, 1994 |
| Grant date | Jan 9, 1996 |
| Priority date | — |
| Expiry date | Aug 18, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A chemical cleaning section of a semiconductor wafer cleaning system has a processing vessel. Two cleaning liquid supplying ports are formed in a bottom portion of the vessel. A holder for holding a plurality of wafers at intervals is arranged in the vessel. A rectifying plate is arranged between the holder and the supplying ports and a diffusion plate is arranged between the rectifying plate and the supplying ports. Bubble storage members are formed on a lower surface of the rectifying plate, so as to be located just above both side edges of the diffusion plate extending in a direction in which the wafers are aligned. The bubble storages are connected to the outside of the vessel through exhaust holes and exhaust pipes. Bubbles contained in a cleaning liquid supplied through the supplying ports are discharged from the bubble storages through the exhaust pipes to the outside of the vessel. As a result, the wafers are not influenced by the bubbles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.