Semiconductor processing with non-jetting fluid stream discharge array
US5489341A · kind A · utility
48Cited by
7References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 23, 1993 |
| Grant date | Feb 6, 1996 |
| Priority date | — |
| Expiry date | Aug 23, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67023
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A semiconductor processor and methods using pillar shaped liquid emitters. The emitters have emission ports upon which liquid domes of processing chemicals are formed. The domes are applied to the surface of a wafer to wash discrete areas and thereby allow gases evolved from the reaction to easily escape about the domes and through gas passageways existing about the pillars. The wafer is rotated to provide even processing of the treated surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.