Eric J. Bergman
83Patents
18h-index
79Co-inventors
87Inventor score
Filing activity: May 21, 1990 → Apr 20, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5377708A | Multi-station semiconductor processor with volatilization | Emerging Cross-Sectional Technologies | 142 | Expired |
| US6286231A | Method and apparatus for high-pressure wafer processing and drying | Electricity | 114 | Expired |
| US5500081A | Dynamic semiconductor wafer processing using homogeneous chemical vapors | Emerging Cross-Sectional Technologies | 102 | Expired |
| US5235995A | Semiconductor processor apparatus with dynamic wafer vapor treatment and particulate volatilization | Emerging Cross-Sectional Technologies | 97 | Expired |
| US5232511A | Dynamic semiconductor wafer processing using homogeneous mixed acid vapors | Physics | 83 | Expired |
| US5762751A | Semiconductor processor with wafer face protection | Electricity | 79 | Expired |
| US5238500A | Aqueous hydrofluoric and hydrochloric acid vapor processing of semiconductor wafers | Physics | 71 | Expired |
| US5370741A | Dynamic semiconductor wafer processing using homogeneous chemical vapors | Emerging Cross-Sectional Technologies | 56 | Expired |
| US6273108A | Apparatus and method for processing the surface of a workpiece with ozone | Emerging Cross-Sectional Technologies | 54 | Expired |
| US6267125A | Apparatus and method for processing the surface of a workpiece with ozone | Emerging Cross-Sectional Technologies | 52 | Expired |
| US6240933A | Methods for cleaning semiconductor surfaces | Emerging Cross-Sectional Technologies | 51 | Expired |
| US5332445A | Aqueous hydrofluoric acid vapor processing of semiconductor wafers | Physics | 49 | Expired |
| US5489341A | Semiconductor processing with non-jetting fluid stream discharge array | Electricity | 48 | Expired |
| US5584310A | Semiconductor processing with non-jetting fluid stream discharge array | Electricity | 43 | Expired |
| US5954911A | Semiconductor processing using vapor mixtures | Emerging Cross-Sectional Technologies | 35 | Expired |
| US6869487B1 | Process and apparatus for treating a workpiece such as a semiconductor wafer | Emerging Cross-Sectional Technologies | 27 | Expired |
| US6497768B2 | Process for treating a workpiece with hydrofluoric acid and ozone | Emerging Cross-Sectional Technologies | 23 | Expired |
| US6582525B2 | Methods for processing a workpiece using steam and ozone | Emerging Cross-Sectional Technologies | 20 | Expired |
| US6591845B1 | Apparatus and method for processing the surface of a workpiece with ozone | Emerging Cross-Sectional Technologies | 18 | Expired |
| US7264680B2 | Process and apparatus for treating a workpiece using ozone | Emerging Cross-Sectional Technologies | 18 | Expired |
| US6199298A | Vapor assisted rotary drying method and apparatus | Emerging Cross-Sectional Technologies | 17 | Expired |
| US6357142B1 | Method and apparatus for high-pressure wafer processing and drying | Electricity | 17 | Expired |
| US6817370B2 | Method for processing the surface of a workpiece | Emerging Cross-Sectional Technologies | 16 | Expired |
| US6745494B2 | Method and apparatus for processing wafers under pressure | Electricity | 16 | Expired |
| US6837252B2 | Apparatus for treating a workpiece with steam and ozone | Emerging Cross-Sectional Technologies | 14 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.