Deposition apparatus and method
US5492737A · kind A · utility
0Cited by
1References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 1, 1994 |
| Grant date | Feb 20, 1996 |
| Priority date | — |
| Expiry date | Aug 1, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3328
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A reactor 10 defines a chamber 11 in which are disposed an upper electrode 12 and a lower workpiece electrode 13. The upper electrode is connected to a R.F. supply whilst the lower electrode is connected to a stress control unit 14. The stress control unit is used to adjust or maintain the effective resistance of the connection between the workpiece electrode 13 and ground.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.