Wafer cleaning tank
US5503173A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 8, 1994 |
| Grant date | Apr 2, 1996 |
| Priority date | — |
| Expiry date | Dec 8, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S269/903
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A wafer cleaning tank including a tank body containing therein a cleaning solution, and wafer supporting device for substantially vertically supporting at least one wafer in the tank body, wherein the wafer supporting device includes a pair of confronting fixed wafer support members disposed in the tank body with a predetermined space therebetween and each having at least one side wafer-supporting portion, and a movable wafer support member vertically movably disposed centrally between the fixed wafer support members at a level below the fixed wafer support members and having at least one central wafer-supporting portion corresponding in position to the position of the side wafer-supporting portion of each of the fixed wafer support members, and wherein the side wafer-supporting portions and the central wafer-supporting portion jointly form a three-point support structure which supports the wafer at three points on the outer edge thereof. The wafer cleaning tank thus constructed is capable of cleaning a plurality of wafers at one time and well adaptable to the cleaning of wafers of different diameters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.