Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber
US5503676A · kind A · utility
63Cited by
11References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 8, 1995 |
| Grant date | Apr 2, 1996 |
| Priority date | — |
| Expiry date | Feb 8, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/905
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for removing extraneous deposits from particle control surfaces in a microwave plasma generating device. An annular magnetron plasma is formed in contact with a particle control surface having a shape which intersects 200-500 G lines of magnetic induction. The magnetron plasma is scanned across particle control surfaces on a horn and chuck by increasing the current to the main coil and/or mirror coil of the apparatus. As the magnetron plasma moves across the particle control surfaces, the plasma reacts with the extraneous deposits and etches the deposits off of the particle control surfaces.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.