Dean R. Denison
11Patents
9h-index
17Co-inventors
69Inventor score
Filing activity: Jul 29, 1976 → Mar 29, 1999
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5200232A | Reaction chamber design and method to minimize particle generation in chemical vapor deposition reactors | Electricity | 95 | Expired |
| US5750211A | Process for depositing a SiO.sub.x film having reduced intrinsic stress and/or reduced hydrogen content | Chemistry; Metallurgy | 64 | Expired |
| US5503676A | Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber | Emerging Cross-Sectional Technologies | 63 | Expired |
| US5869149A | Method for preparing nitrogen surface treated fluorine doped silicon dioxide films | Electricity | 36 | Expired |
| US4101874A | Fluid flow indicator and flow switch | Physics | 35 | Expired |
| US6042901A | Method for depositing fluorine doped silicon dioxide films | Electricity | 26 | Expired |
| US5911833A | Method of in-situ cleaning of a chuck within a plasma chamber | Emerging Cross-Sectional Technologies | 25 | Expired |
| US6326064A | Process for depositing a SiOx film having reduced intrinsic stress and/or reduced hydrogen content | Chemistry; Metallurgy | 22 | Expired |
| US5368646A | Reaction chamber design to minimize particle generation in chemical vapor deposition reactors | Electricity | 18 | Expired |
| US5841623A | Chuck for substrate processing and method for depositing a film in a radio frequency biased plasma chemical depositing system | Emerging Cross-Sectional Technologies | 9 | Expired |
| US5897711A | Method and apparatus for improving refractive index of dielectric films | Electricity | 4 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.