Vacuum processing apparatus
US5509771A · kind A · utility
Assignees
Inventor
Key dates
| Filing date | Jul 28, 1993 |
| Grant date | Apr 23, 1996 |
| Priority date | — |
| Expiry date | Jul 28, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/139
- WIPO fieldHandling
- WIPO sectorMechanical engineering
Abstract
A vacuum processing apparatus in which LCD substrates are processed includes three process chambers. Each of the process chambers is connected to a first load lock chamber through a gate valve. A second load lock chamber is also connected to the first load lock chamber through a gate valve. The second load lock chamber is opposed to a carrier member, which is arranged in the atmosphere, through a gate valve. A carrier arm is arranged in the first load lock chamber to carry the substrates between each of the process chambers and the second load lock chamber. A buffer rack for supporting two substrates thereon and positioners for aligning the two substrates, which are supported on the buffer rack, simultaneously are arranged in the second load lock chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.