Susceptor and baffle therefor
US5518549A · kind A · utility
536Cited by
5References
22Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 18, 1995 |
| Grant date | May 21, 1996 |
| Priority date | — |
| Expiry date | Apr 18, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68792
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A susceptor for holding semiconductor wafers in a barrel reactor for chemical vapor deposition of material on the wafers having a baffle for reducing the amount of material deposited at the bottom of the lowest wafers held in the susceptor. The baffle includes a plate mounted on the bottom of the susceptor and a deflector for each wall of the susceptor. The deflectors each have the shape of a chordal section of a cylinder and are mounted on the plate against a respective wall of the susceptor below the lowest wafer-holding recess on that wall of the susceptor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.