Method and apparatus for altering magnetic coil current to produce etch uniformity in a magnetic field-enhanced plasma reactor
US5534108A · kind A · utility
30Cited by
4References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 7, 1995 |
| Grant date | Jul 9, 1996 |
| Priority date | — |
| Expiry date | Mar 7, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A magnetic field enhanced plasma etch reactor system and method of operation is disclosed. In the system and operation, modulated sinusoidal currents are generated and applied 90.degree. out of phase to opposing pairs of series connected electromagnets to produce a modified rotating magnetic field parallel to a substrate processed in the system. The modification of the rotating magnetic field, in turn, results in an improvement in the uniformity of the etch pattern over the upper surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.