Monolithic semiconductor body with convex structure
US5539216A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 27, 1994 |
| Grant date | Jul 23, 1996 |
| Priority date | — |
| Expiry date | Oct 27, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S257/915
Abstract
A monolithic semiconductor body (26) resides in an opening (16) formed in an insulating layer (14). The monolithic semiconductor body (26) includes an elongated region (20) filling the opening (16) in the insulating layer (14) and contacting a semiconductor region (12). The monolithic semiconductor body (26) further includes a surface region (24) overlying the elongated region (20) and a portion of the surface (22) of the insulating layer (14) adjacent to the opening (16). The monolithic semiconductor body (26) is fabricated by first depositing a layer of semiconductor material into the opening (16), then planarizing the surface of the insulating layer (14). Next, a selective deposition process is carried out to form the surface region (24) using the semiconductor material in the opening (16) as a nucleation site. The radius of curvature of the surface region (24) is determined by the amount of controlled overgrowth during the selective deposition process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.