Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring
US5552256A · kind A · utility
1Cited by
14References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 29, 1994 |
| Grant date | Sep 3, 1996 |
| Priority date | — |
| Expiry date | Sep 29, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/168
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Quinone diazo compounds having bonded to the diazo ring or directly bonded to a ring of the compound, certain non-metallic atoms that improve the photosensitivity thereof are provided. These quinone diazo compounds are useful as photoactive compounds in photoresist compositions, and particularly positive photoresist composition employed in x-ray or electron beam radiation. Also provided is a method for preparing compounds of the present invention.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.