David E. Seeger
31Patents
12h-index
49Co-inventors
81Inventor score
Filing activity: Apr 28, 1986 → Jun 6, 2008
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5470661A | Diamond-like carbon films from a hydrocarbon helium plasma | Emerging Cross-Sectional Technologies | 265 | Expired |
| US6685853B1 | Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewith | Electricity | 62 | Expired |
| US5370825A | Water-soluble electrically conducting polymers, their synthesis and use | Electricity | 54 | Expired |
| US5569501A | Diamond-like carbon films from a hydrocarbon helium plasma | Emerging Cross-Sectional Technologies | 53 | Expired |
| US6639488B2 | MEMS RF switch with low actuation voltage | Electricity | 52 | Expired |
| US4752668A | System for laser removal of excess material from a semiconductor wafer | Physics | 51 | Expired |
| US7230334B2 | Semiconductor integrated circuit chip packages having integrated microchannel cooling modules | Electricity | 41 | Expired |
| US6187505A | Radiation sensitive silicon-containing resists | Physics | 25 | Expired |
| US6344305B1 | Radiation sensitive silicon-containing resists | Physics | 21 | Expired |
| US6010645A | Water-soluble electrically conducting polymers, their synthesis and use | Electricity | 15 | Expired |
| US6132644A | Energy sensitive electrically conductive admixtures | Electricity | 14 | Expired |
| US5264328A | Resist development endpoint detection for X-ray lithography | Emerging Cross-Sectional Technologies | 13 | Expired |
| US5593812A | Photoresist having increased sensitivity and use thereof | Emerging Cross-Sectional Technologies | 12 | Expired |
| US6876282B2 | Micro-electro-mechanical RF switch | Electricity | 12 | Expired |
| US7948077B2 | Integrated circuit chip module with microchannel cooling device having specific fluid channel arrangement | Electricity | 9 | Active |
| US5759637A | Water-Soluable electrically conducting polymers, their synthesis and use | Electricity | 8 | Expired |
| US6103145A | Crosslinked water-soluble electrically conducting polymers | Electricity | 7 | Expired |
| US5753412A | Photoresist having increased sensitivity and use thereof | Emerging Cross-Sectional Technologies | 6 | Expired |
| US5770345A | Photoresist having increased sensitivity and use thereof | Emerging Cross-Sectional Technologies | 6 | Expired |
| US7888786B2 | Electronic module comprising memory and integrated circuit processor chips formed on a microchannel cooling device | Electricity | 5 | Active |
| US5567569A | Process for producing a positive pattern utilizing naphtho quinone diazide compound having non-metallic atom directly bonded to the naphthalene ring | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6830708B2 | Water-soluble electrically conducting polymers, their synthesis and use | Emerging Cross-Sectional Technologies | 3 | Expired |
| US5955242A | High sensitivity, photo-active polymer and developers for high resolution resist applications | Emerging Cross-Sectional Technologies | 3 | Expired |
| US7212091B2 | Micro-electro-mechanical RF switch | Electricity | 3 | Expired |
| US5908732A | Polymer compositions for high resolution resist applications | Emerging Cross-Sectional Technologies | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.