Power control and delivery in plasma processing equipment
US5556549A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 2, 1994 |
| Grant date | Sep 17, 1996 |
| Priority date | — |
| Expiry date | May 2, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/334
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention relates to a system and method for control and delivery of radio frequency power in plasma process systems. The present invention monitors the power, voltage, current, phase, impedance, harmonic content and direct current bias of the radio frequency energy being delivered to the plasma chamber. In addition, the plasma mode of operation may be controlled by creating either a capacitively or inductively biased radio frequency source impedance. A radio frequency circulator prevents reflected power from the plasma chamber electrode to damage the power source and it further dissipates the reflected power in a termination resistor. The termination resistor connected to the circulator also effectively terminates harmonic energy caused by the plasma non-linearities. Multiple plasma chamber electrodes and radio frequency power sources may be similarly controlled.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.