Dual cathode sputter coating apparatus
US5558751A · kind A · utility
35Cited by
5References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 8, 1995 |
| Grant date | Sep 24, 1996 |
| Priority date | — |
| Expiry date | Feb 8, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/34
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a coating apparatus, a sputter cathode (1) has, directly side by side, two electrodes (2, 3) connected in common to a high-frequency generator and having each a target (9, 10). The targets (9, 10) of both electrodes (2, 3) abut one another each with a straight edge (11, 12). A dark space shield surrounds both electrodes (2, 3) and targets (9, 10) together.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.