In-situ monitoring of the change in thickness of films
US5559428A · kind A · utility
164Cited by
26References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 10, 1995 |
| Grant date | Sep 24, 1996 |
| Priority date | — |
| Expiry date | Apr 10, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B7/10
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The change in thickness of a film on an underlying body such as a semiconductor substrate is monitored in situ by inducing a current in the film, and as the thickness of the film changes (either increase or decrease), the changes in the current are detected. With a conductive film, eddy currents are induced in the film by a generating an alternating electromagnetic field with a sensor which includes a capacitor and an inductor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.