Temperature controlling device for mask and wafer holders
US5577552A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 28, 1995 |
| Grant date | Nov 26, 1996 |
| Priority date | — |
| Expiry date | Mar 28, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05D23/1919
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A temperature controlling device suitably usable in a semiconductor microcircuit manufacturing exposure apparatus exposes a semiconductor wafer to a mask to print a pattern of the mask on the wafer. The device includes a constant-temperature liquid medium supplying system for controlling temperature of a liquid at high precision, a distributing system for distributing the supplied liquid medium into plural flow passages, to supply the liquid medium to plural subjects of control such as, for example, a mask stage, a wafer stage and the like. The device further includes a plurality of temperature controls each being provided in corresponding one of the flow passages, for correction of any variance in temperature of the distributed liquid medium, resulting from pressure loss energies in the respective flow passages. Thus, temperatures of plural subjects of control can be controlled efficiently and with a simple structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.