Coil configurations for improved uniformity in inductively coupled plasma systems
US5578165A · kind A · utility
17Cited by
1References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 27, 1995 |
| Grant date | Nov 26, 1996 |
| Priority date | — |
| Expiry date | Mar 27, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention relates to a method for generating a low pressure plasma circulating in a planar direction within a process enclosure. The invention generates plasma having substantially uniform density characteristics across a planar axis. The invention achieves improved uniformity of the plasma density by delivering more radio frequency power toward the periphery of the circulating plasma than toward the center of the plasma. Increasing the periphery power to the circulating plasma compensates for increased plasma losses due to interaction with the side walls of the process containment enclosure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.