Patent · US Expired

Modified reaction chamber and improved gas flushing method in rapid thermal processing apparatus

US5580830A · kind A · utility

7Cited by

6References

23Claims

0Family size

Assignee

AST Elekronik GmbH · DE

Inventors

Zsolt Nenyei · Blaustein, DE
Helmut Merkle · Bethesda, US
Andreas Tillmann · Unterhaching, DE

Key dates

Filing date	Feb 13, 1995
Grant date	Dec 3, 1996
Priority date	—
Expiry date	Feb 13, 2015

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S438/935
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A reaction chamber for a Rapid Thermal Processing (RTP) system contains an aperture to allow introduction and removal of the object to be processed. The cross sectional area of the aperture is significantly less than the cross sectional area of the reaction chamber. A method of flushing the reaction chamber, using a short time laminar flow of the flush gas, is used in combination with the aperture to increase the throughput of the RTP system.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.