Multi-beam scanning projection exposure apparatus and method with beam monitoring and control for uniform exposure of large area
US5581075A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 22, 1995 |
| Grant date | Dec 3, 1996 |
| Priority date | — |
| Expiry date | May 22, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70791
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus comprises a plurality of illumination optical systems for generating a plurality of light beams, a plurality of projection optical systems disposed corresponding to the plurality of illumination optical systems, respectively, a plurality of light intensity detectors, provided respectively for the plurality of illumination optical systems, for detecting individual intensities of the plurality of light beams, a light intensity changing device for changing the respective intensities of the plurality of light beams, and a control device for controlling the light intensity changing device and uniformizing the intensities of the plurality of light beams to a substantially fixed level.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.