Electrically tuned matching networks using adjustable inductance elements
US5585766A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 27, 1994 |
| Grant date | Dec 17, 1996 |
| Priority date | — |
| Expiry date | Oct 27, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01F29/146
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing system for use in fabricating electronic devices including an RF generator; a process chamber including an electrical load which produces a plasma within the chamber when powered by the RF generator; an electronically tunable matching network connected between the RF generator and the electrical load of the process chamber, wherein during operation the matching network couples power from the RF generator into the plasma within the process chamber; and a control circuit connected to the matching network, wherein during operation the control circuit electronically adjusts the matching network so as to control a transfer of power from the RF generator into the plasma in the process chamber. The matching network includes an electronically tunable variable inductor including a core made of a material which exhibits a non-linear relationship between magnetic field intensity, H, and magnetic flux density, B. The core is configured as a closed loop defining a central opening. A magnetization coil is wound around the core so that the core forms a closed magnetic flux path for the magnetization coil. The magnetization coil includes two input terminals for coupling an elec…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.