Electrostatic chuck for magnetic flux processing
US5592358A · kind A · utility
297Cited by
9References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 18, 1994 |
| Grant date | Jan 7, 1997 |
| Priority date | — |
| Expiry date | Jul 18, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49117
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An electrostatic chuck 20 for holding substrates 42 in a process chamber 40 containing a magnetic flux 43 comprises a base 22 having an upper surface adapted to support a substrate 42 thereon. An insulator 26 with an electrode 24 therein, is on the base 22. A magnetic shunt 34 comprising a ferromagnetic material is positioned (i) either on the base 22, or (ii) in the insulator 26, or (iii) directly below, and contiguous to, the base 22.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.