Chandra Deshpandey
17Patents
12h-index
34Co-inventors
78Inventor score
Filing activity: Aug 12, 1985 → Feb 25, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7544398B1 | Controlled nano-doping of ultra thin films | Chemistry; Metallurgy | 409 | Expired |
| US5592358A | Electrostatic chuck for magnetic flux processing | Emerging Cross-Sectional Technologies | 297 | Expired |
| US5996218A | Method of forming an electrostatic chuck suitable for magnetic flux processing | Emerging Cross-Sectional Technologies | 158 | Expired |
| US5055319A | Controlled high rate deposition of metal oxide films | Chemistry; Metallurgy | 81 | Expired |
| US5631803A | Erosion resistant electrostatic chuck with improved cooling system | Electricity | 79 | Expired |
| US5636098A | Barrier seal for electrostatic chuck | Electricity | 49 | Expired |
| US4931158A | Deposition of films onto large area substrates using modified reactive magnetron sputtering | Electricity | 48 | Expired |
| US5822171A | Electrostatic chuck with improved erosion resistance | Emerging Cross-Sectional Technologies | 36 | Expired |
| US6023405A | Electrostatic chuck with improved erosion resistance | Emerging Cross-Sectional Technologies | 31 | Expired |
| US6557248B1 | Method of fabricating an electrostatic chuck | Emerging Cross-Sectional Technologies | 24 | Expired |
| US6362097B1 | Collimated sputtering of semiconductor and other films | Electricity | 21 | Expired |
| US4714625A | Deposition of films of cubic boron nitride and nitrides of other group III elements | Chemistry; Metallurgy | 16 | Expired |
| US6535372B2 | Controlled resistivity boron nitride electrostatic chuck apparatus for retaining a semiconductor wafer and method of fabricating the same | Emerging Cross-Sectional Technologies | 12 | Expired |
| US6033483A | Electrically insulating sealing structure and its method of use in a high vacuum physical vapor deposition apparatus | Emerging Cross-Sectional Technologies | 11 | Expired |
| US6436509B1 | Electrically insulating sealing structure and its method of use in a semiconductor manufacturing apparatus | Emerging Cross-Sectional Technologies | 3 | Expired |
| US6821562B2 | Method of forming an electrically insulating sealing structure for use in a semiconductor manufacturing apparatus | Emerging Cross-Sectional Technologies | 1 | Expired |
| US12084763B2 | Microstructure control of conducting materials through surface coating of powders | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.