Scanning electron microscope and method for dimension measuring by using the same
US5594245A · kind A · utility
47Cited by
8References
20Claims
0Family size
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Key dates
| Filing date | Feb 10, 1995 |
| Grant date | Jan 14, 1997 |
| Priority date | — |
| Expiry date | Feb 10, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/281
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam, which can transmit through part of a specimen and can reach a portion that is not exposed to the electron beam, is irradiated, and a scanning image is obtained on the basis of a signal secondarily generated from a portion irradiated with the electron beam. Dimension-measuring start and end points are set on the scanning image and a dimension therebetween is measured. A three-dimensional model is assumed, the three-dimensional model is modified so as to match the scanning image, and dimension measurement is carried out on the basis of a modified three-dimensional model.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.