Semiconductor wafer edge polishing system and method
US5595522A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 4, 1994 |
| Grant date | Jan 21, 1997 |
| Priority date | — |
| Expiry date | Jan 4, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/959
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
An edge polishing system (20, 320) and method for edge polishing semiconductor wafers is disclosed. The system (20, 320) includes a loader (22, 326), a polisher (24, 328), an unloader (26, 330), and a controller (28, 335). The method includes the steps of loading wafers (28), and spacers (30) into a loader (22) to form a stack (36), moving the stack (36) into a polisher (24) and causing polisher (24) to polish the stack (36), then moving the stack (36) to an unloader (26), which semiautomatically removes the wafers (28) and spacers (30). The system (20) may include a controller (28) for entering the appropriate commands.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.