Patent · US Expired

Semiconductor wafer edge polishing system and method

US5595522A · kind A · utility

19Cited by
11References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 4, 1994
Grant dateJan 21, 1997
Priority date
Expiry dateJan 4, 2014

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S438/959
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

An edge polishing system (20, 320) and method for edge polishing semiconductor wafers is disclosed. The system (20, 320) includes a loader (22, 326), a polisher (24, 328), an unloader (26, 330), and a controller (28, 335). The method includes the steps of loading wafers (28), and spacers (30) into a loader (22) to form a stack (36), moving the stack (36) into a polisher (24) and causing polisher (24) to polish the stack (36), then moving the stack (36) to an unloader (26), which semiautomatically removes the wafers (28) and spacers (30). The system (20) may include a controller (28) for entering the appropriate commands.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.