Scanning exposure apparatus and exposure method
US5602620A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 14, 1995 |
| Grant date | Feb 11, 1997 |
| Priority date | — |
| Expiry date | Jun 14, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is directed to scanning exposure apparatus and exposure method to achieve simultaneous projection of images of plural regions on a mask onto a photosensitive substrate with correcting an orthogonality error of a pattern on the mask or photosensitive substrate. If the pattern on the mask or photosensitive substrate has an orthogonality error causing a deviation of a certain angle in a first direction perpendicular to a scanning direction as it goes in the scanning direction, the mask and the photosensitive substrate are rotated relative to each other in the plane thereof to align one coordinate axis in a coordinate system of each pattern with the first direction. Then a relative displacement is given by an amount of the orthogonality error between positions of images projected through a first optical system and positions of images projected through a second optical system, and relative positions of the mask and the photosensitive substrate are continuously changed by the amount of the orthogonality error in the first direction in accordance with the position of the mask or photosensitive substrate in the scanning direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.