Exposure apparatus and exposure method
US5617181A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 15, 1996 |
| Grant date | Apr 1, 1997 |
| Priority date | — |
| Expiry date | Mar 15, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70558
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus and an exposure method for fabricating semiconductor devices or liquid crystal display boards. The scanning means synchronously moves the mask and the photosensitive substrate with respect to the plurality of projection optical systems, and patterns formed on the mask are projected onto the photosensitive substrate while images of mask formed by adjacent illumination optical systems are made overlapping with each other. On this occasion, the controlling means controls the light intensity changing means, and the light intensity changing means changes the intensity of a light beam of each illumination optical system, so that two intensities of overlapping parts in adjacent illumination areas become substantially equal to each other. The control by the controlling means is carried out based on the light intensities of the overlapping illumination areas as detected by the light intensity detecting means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.