Method and apparatus for wavevector selective pyrometry in rapid thermal processing systems

US5628564A · kind A · utility

Assignee

• AST Elekronik GmbH · DE

Inventors

• Zsolt Nenyei · Blaustein, DE
• Andreas Tillmann · Unterhaching, DE
• Heinrich Walk · Allmendingen, DE

Key dates

• Filing date: Mar 28, 1995
• Grant date: May 13, 1997
• Expiry date: Mar 28, 2015

Classification

• Technology area (CPC G): Physics
• CPC primary: G01J5/80
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A method and apparatus for optical pyrometry in a Rapid Thermal Processing (RTP) System, whereby the radiation used to heat the object to be processed in the RTP system is in part specularly reflected from specularly reflecting surfaces and is incident on the object with a particular angular distribution, and the thermal radiation from the object is measured at an angles different from the angle where the incident radiation specularly reflected from the surface of the object is a maximum.