Plasma processing method and plasma generator
US5637180A · kind A · utility
24Cited by
4References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 25, 1995 |
| Grant date | Jun 10, 1997 |
| Priority date | — |
| Expiry date | Sep 25, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/452
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma-processing method used in processes for manufacturing semiconductor devices. During plasma processing, ultraviolet radiation is emitted from a region where a plasma is created. An ultraviolet radiation-blocking means blocks the ultraviolet radiation from impinging on the sample surface to protect it. The blocking means passes particles forming a plasma onto the sample surface. The particles passed through the ultraviolet radiation-blocking plates are implanted into the sample. Alternatively, the processed surface of the sample is etched, or a film is deposited on the processed surface of the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.