IC analysis system having charged particle beam apparatus for improved contrast image
US5640539A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 21, 1994 |
| Grant date | Jun 17, 1997 |
| Priority date | — |
| Expiry date | Sep 21, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/307
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The object of the invention is to provide an IC analysis system having a charged particle beam apparatus in which the operability and picture quality have been enhanced and the measurement method of a device under test. In the IC analysis system, stop signal generating means in which the stop signal stimulates the acquisition of image data is added to a test pattern generator and acquisition completion signal generating means which releases the stopping state on completing the acquisition of image data and which resumes the test pattern updating operation is added to the charged particle beam apparatus. Furthermore, by adding mode select means to the charged particle beam apparatus, a clearer potential contrast image can be obtained. The methods for locating fault positions can be realized in the IC analysis system having the charged particle beam apparatus wherein the image data can be obtained by alternate test patterns, or by adding one image data to the reverse potential of another image data, or by scanning and irradiating the charged particle beam onto the same surface of the device at a plurality of times.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.