Apparatus for producing an inductive plasma for plasma processes
US5650032A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 6, 1995 |
| Grant date | Jul 22, 1997 |
| Priority date | — |
| Expiry date | Jun 6, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An efficient RF coil for inductively coupled plasmas provides either capacitive or inductive coupling to the plasma. The coil has a layered structure including at least one RF coil, an insulator having a low dielectric constant and a second RF magnetic structure. The second RF magnetic structure may be either a second RF coil or a Faraday shield. In a two coil structure, the first RF coil has a first magnetic sense upon energization by an RF source, and the second RF coil has a second magnetic sense opposite the first magnetic sense. An RF source is connected to the high voltage ends of the two RF coil. Uniform capacitive coupling is achieved by the use of a Faraday shield located between the RF coil and the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.