Michael Barnes
123Patents
43h-index
141Co-inventors
93Inventor score
Filing activity: May 17, 1991 → May 2, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7915139B1 | CVD flowable gap fill | Electricity | 775 | Active |
| US6303523A | Plasma processes for depositing low dielectric constant films | Emerging Cross-Sectional Technologies | 649 | Expired |
| US7582555B1 | CVD flowable gap fill | Electricity | 563 | Expired |
| US5679215A | Method of in situ cleaning a vacuum plasma processing chamber | Emerging Cross-Sectional Technologies | 560 | Expired |
| US7888233B1 | Flowable film dielectric gap fill process | Electricity | 543 | Active |
| US5505816A | Etching of silicon dioxide selectively to silicon nitride and polysilicon | Emerging Cross-Sectional Technologies | 290 | Expired |
| US5178739A | Apparatus for depositing material into high aspect ratio holes | Electricity | 276 | Expired |
| US5835334A | Variable high temperature chuck for high density plasma chemical vapor deposition | Emerging Cross-Sectional Technologies | 201 | Expired |
| US5670066A | Vacuum plasma processing wherein workpiece position is detected prior to chuck being activated | Emerging Cross-Sectional Technologies | 182 | Expired |
| US6170429A | Chamber liner for semiconductor process chambers | Emerging Cross-Sectional Technologies | 144 | Expired |
| US6013155A | Gas injection system for plasma processing | Electricity | 144 | Expired |
| US7524735B1 | Flowable film dielectric gap fill process | Electricity | 124 | Active |
| US5241245A | Optimized helical resonator for plasma processing | Electricity | 121 | Expired |
| US6042687A | Method and apparatus for improving etch and deposition uniformity in plasma semiconductor processing | Electricity | 99 | Expired |
| US6348725B1 | Plasma processes for depositing low dielectric constant films | Emerging Cross-Sectional Technologies | 94 | Expired |
| US6660656B2 | Plasma processes for depositing low dielectric constant films | Emerging Cross-Sectional Technologies | 91 | Expired |
| US5689215A | Method of and apparatus for controlling reactive impedances of a matching network connected between an RF source and an RF plasma processor | Electricity | 88 | Expired |
| US5982099A | Method of and apparatus for igniting a plasma in an r.f. plasma processor | Electricity | 87 | Expired |
| US6853141B2 | Capacitively coupled plasma reactor with magnetic plasma control | Electricity | 84 | Expired |
| US6583071B1 | Ultrasonic spray coating of liquid precursor for low K dielectric coatings | Electricity | 83 | Expired |
| US6507155B1 | Inductively coupled plasma source with controllable power deposition | Electricity | 80 | Expired |
| US5892198A | Method of and apparatus for electronically controlling r.f. energy supplied to a vacuum plasma processor and memory for same | Electricity | 73 | Expired |
| US5463525A | Guard ring electrostatic chuck | Emerging Cross-Sectional Technologies | 71 | Expired |
| US5561585A | Electrostatic chuck with reference electrode | Emerging Cross-Sectional Technologies | 66 | Expired |
| US5838529A | Low voltage electrostatic clamp for substrates such as dielectric substrates | Emerging Cross-Sectional Technologies | 65 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.