Cleaning apparatus for cleaning substrates
US5651160A · kind A · utility
51Cited by
10References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 17, 1996 |
| Grant date | Jul 29, 1997 |
| Priority date | — |
| Expiry date | Jan 17, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The cleaning apparatus for cleaning a semiconductor wafer W as a substrate, has a holding mechanism for holding the wafer, a motor for rotating the wafer held by the holding mechanism, and a cleaning section provided on at least one side of the wafer held by the holding mechanism. The cleaning section includes at least one cleaning member provided so as to be brought into contact with the wafer W, and the cleaning member is movable along with the rotation of the substrate rotated by the motor while it is in contact with the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.