Target and dark space shield for a physical vapor deposition system
US5658442A · kind A · utility
56Cited by
3References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 7, 1996 |
| Grant date | Aug 19, 1997 |
| Priority date | — |
| Expiry date | Mar 7, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3447
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The disadvantages heretofore associated with the prior art are overcome by the present invention of an improved target for a physical deposition (PVD) system. The improved target has a portion of the target side wall the overhangs and shadows the side wall of the target thus preventing material from depositing on the edge. To further reduce contaminant generation, the improved target is combined with an improved dark space shield having a first end and a second end, where the second end conventionally supports a collimator and the first end has an inner surface that is substantially vertical.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.